Name: Forno di ossidazione LPCVD da 8/6/4/2 pollici con automazione completa Controllo a basso ossigeno Deposito di pellicola sottile
Uploaded: 2026-03-10CDT00:13:12-05:00
Duration: 46 s
Description: Discover the 8/6/4/2Inch LPCVD Oxidation Furnace, a fully automated system for thin film deposition with low oxygen control. Ideal for semiconductor manufacturing, it ensures excellent film uniformity and repeatability, supporting various oxidation, annealing, and LPCVD processes. Perfect for high-volume production with seamless MES integration.

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Forno di ossidazione LPCVD da 8/6/4/2 pollici con automazione completa Controllo a basso ossigeno Deposito di pellicola sottile

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April 27, 2025

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Descrizione video:

Discover the 8/6/4/2Inch LPCVD Oxidation Furnace, a fully automated system for thin film deposition with low oxygen control. Ideal for semiconductor manufacturing, it ensures excellent film uniformity and repeatability, supporting various oxidation, annealing, and LPCVD processes. Perfect for high-volume production with seamless MES integration.

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